Stabilization of the Li3PS4/Li interface by a 4 nm Al2O3 coating studied by in situ HAXPES

Référence
L. Pérez Ramírez, J. Sottmann, B. Hennequart, M. Radi, M. Hallot, C. Lethien, L. Dudy, J.-P. Rueff, R. Dedryvère "Stabilization of the Li3PS4/Li interface by a 4 nm Al2O3 coating studied by in situ HAXPES". Materials Today Communications, 53():115388. (2026).
Année de publication
2026
Auteurs
L. Pérez Ramírez
J. Sottmann
B. Hennequart
M. Radi
M. Hallot
C. Lethien
L. Dudy
J.-P. Rueff
R. Dedryvère
Lignes de lumière
rec-number
13213
Référence anonyme
L. Pérez Ramírez, J. Sottmann, B. Hennequart, M. Radi, M. Hallot, C. Lethien, L. Dudy, J.-P. Rueff, R. Dedryvère "Stabilization of the Li3PS4/Li interface by a 4 nm Al2O3 coating studied by in situ HAXPES". Materials Today Communications, 53():115388. (2026).
Type de publication
Date
Jeudi 11 juin 2026

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