PUBLICATIONS

Dernière mise à jour : 09/03/2026
  • Guang, Y., Peng, Y., Yan, Z., Liu, Y., Zhang, J., Zeng, X, Zhang, Sh., Zhang, S., Burn, D.M., Jaouen, N., Wei, J., Xu, H., Feng, J., Fang, C., van der Laan, G., Hesjedal, T., Cui, B., Zhang, X., Yu, G., Han, X. "Electron Beam Lithography of Magnetic Skyrmions" Advanced Materials., 32(39): art.n° 2003003. (2020).