In order to understand the relations between growth, microstructure, interface structure, strain, and physical properties in functional oxide thin films for further applications, a study of infrared and THz spectroscopy combined with theoretical calculation has been performed on the films/substrates model systems, in particular epitaxial SrTiO3/Si(001), VO2/Gd2O3/Si(111) films and alumina/alloy films. The vibrational characteristics of the crystal structure of films have been investigated in the mid and far infrared ranges on the AILES beamline at Synchrotron SOLEIL.
This experimental vibrational study has been combined with Density Functional Theory (DFT) simulation to allow for the first measure of the crystalline structure of these thin films. The 2-dimensional lattice modification compared with the bulk materials 
has been discussed. The strain effect in the films can be evaluated on the phonon shifts compared with the crystal spectrum. The influences of epitaxial conditions on the local interatomic structure of SrTiO3/Si(001) thin films have been estimated. The nature of STO-Si interface can be characterized by the phonon modes. The metal– insulator transition (MIT) of VO2 thin films on Gd2O3/Si(111) substrate have been studied by IR spectroscopy.
The variations of optical and dielectric properties during the MIT, as well as the phonon intensities, indicate that the MIT is driven by electron correlation and the low temperature M1 monoclinic phase of VO2 is a Mott insulator.
This result may help to better understand and control the MITs of VO2 thin films in the device applications.
